LAPECVD™
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high volume production in a wide range of applications.
The LAPECVD™ platform can be used to deposit a variety of thin film materials with its parallel-plate plasma deposition system.
Hardware
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Cassette-to-Cassette Handling
- Multi substrate batch processing
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Dual cassettes
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Platen heating up to 350°C
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Upper electrode RF power at 13.56 MHz with optional MFD
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Up to 8 channels with digital MFCs
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Thermally managed reactor design—up to 175°C for internal walls and shower head
Endpoint
Integrated multifunctional endpoint capability with EndpointWorks.
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Unique OEI application for real-time film thickness and rate monitoring.
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OES for optimized chamber clean.
Software
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User friendly software
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Comprehensive data logging
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Automated cleaning program
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Real-time process data display
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Fully integrated endpoint system
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Factory automation compatible (SECS/GEM)
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Edit recipes during runs
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Multiple user access levels
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Alarm history
Process
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Stress control
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High uniformity
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Low damage
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Low particulates
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Tunable index
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Increased productivity with batch loading capability
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Low temperature
For more information, contact us at information@plasmatherm.com or at +1.727.577.4999 |
