Research & Development
In order to stay at the forefront of technology universities, institutes, and manufactures conduct R&D on a continuous basis to provide solutions for the many global challenges faced today. From lighting to data-storage to clean energy sources, the quest for higher efficiency products that provide higher performance but at lower costs and in smaller form-factors are the main drivers for this R&D.
Plasma-Therm from its inception has been a research partner as well as a supplier to many of the leading universities and R&D institutes worldwide. In addition, Plasma-Therm performs R&D internally to continuously improve the already impressive performance and quality of our products. With manual-load, single-substrate, and cassette-to-cassette configurations, we provide a wide range of plasma etch and deposition solutions to fulfill your R&D requirements.
Advanced process control with Plasma-Therm developed EndpointWorks™
gives researchers valuable insight into their etch and PECVD processes. This coupled with the reproducibility and low maintenance makes Plasma-Therm a premier supplier to R&D.
Typical Applications
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Etch
- Si
- SiN
- SiC
- PSS (patterned sapphire substrate)
- GaN
- GaAs
- AlGaInP (and related materials)
- GaP
- Quartz
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Deposition
- SiNx PECVD stress controlled at high rates with excellent conformality
- SiO2—High breakdown voltage, low stress, low temperature
Products
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