High Density Radical Flux (HDRF™)

Proven and safe material removal for demanding applications

Content

Some like it hot, some like it not. With Plasma-Therm®, you can have it both ways.

Our HDRF low temperature technology is proven for demanding applications. Remove photoresist and polymer residue without damaging your sensitive devices and complex structures – for optimal quality of Bosch-process devices.

Proprietary Source

HDRF technology incorporates a proprietary, distributed inductively coupled plasma (ICP) source

Source Design

The unique source design produces 50 to 100 times more radicals than other technologies and delivers damage-free process results

Before and After

The HDRF application portfolio includes scallop smoothing after DRIE, and surface activation before wafer bonding

Other Processes

Our high temperature stripping can also support descum and polyimide processes, as well as BCB, SU8 and PBO ashing

OUR HDRF PRODUCTS

EXPLORE TECHNICAL PAPERS

Want to learn more about this topic? Click here to review technical papers on HDRF etch principles, practices and outcomes.

SEE ALL ETCH PRODUCTS

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