CORTEX® FOR DATA LOGGING AND CHARTING
The Cortex control system provides a stable, user-friendly control interface designed for efficiency and productivity. It offers comprehensive data logging and charting functions. Data can be displayed in tabular format, and charts can be created from real-time data and process data saved on disk. You can view parameter data and multiparameter charts within Cortex and also export the outputs for use in other programs.
ENDPOINTWORKS® FOR ULTIMATE CONTROL AND OUTPUTS
EndpointWorks is our primary software platform, designed as a highly flexible endpoint detection system that utilizes multiple inputs to determine a process endpoint. Internally developed, the software surpasses industry standards in repeatability and uniformity as it provides real-time endpoint monitoring of etch and deposition processes. The new platform is an evolution of our SpectraWorks control system, which existing users can upgrade with recipe transferability.
EndpointWorks is fully integrated with the process module control software and can address and receive input from multiple endpoint sensor inputs. Once input is received, the software leverages a “decision” feature to analyze the data and determine a highly reproducible endpoint.
The module software can detect an endpoint from an array of sensor systems, as listed below, and new endpoint techniques can be rapidly integrated with existing systems and put into production. EndpointWorks also features a wide array of user-friendly tools to assist in the analysis of historical data and optimization of new recipes.
Laser Interferometry and Reflectometry
Using the well-known principles of reflectometry and interferometry, coupled with a solid-state CCD camera for laser spot location, material interfaces and etch depths can be determined from the reflected signal.
Optical Emission Spectroscopy (OES)
Film layers are detected by monitoring the plasma emission, which is influenced by the material being etched. Spectral changes occur as the etching proceeds through the various target layers.
Optical Emission Interferometry (OEI)
Target-film thickness is tracked and measured using plasma emission as the interrogating light source and monitoring the reflected signal from the substrate being etched. By optically tracking film thickness or etch depth in real time, EndpointWorks algorithms enhance reproducibility.
EndpointWorks is capable of being programmed with various system parameters, such as throttle valve position and matching capacitor positions, to detect changes triggered at endpoint.
EndpointWorks is capable of customer-specific external inputs, such as RGA and ellipsometer.
Integrated multifunctional endpoint capability with EndpointWorks to address multiple materials and applications:
- Laser interferometry and reflectometry
- Optical emission spectroscopy (OES)
- Optical emission interferometry (OEI)
- System parameters (throttle valve position, pressure, matching position) or custom inputs (RGA, ellipsometer)
Cortex Control System
- Graphical, SEMI-standard (E-95) interface
- Integrated recipe editing, offering both tabular and detailed views, ability to export to PDF
- Comprehensive process parameter data logging and charting (real-time and post-processing)
- Automated clean and conditioning routines with configurable triggers
- Factory automation host interface (with optional SECS/GEM license)
- User-level access control
- Auto logging of alarms, jobs, calibration, and resource usage
- Integrated with GLANCE™ data logging and analysis program
Our control software implements numerous Our control software implements numerous productivity-enhancement features, including real-time graphical representation and logging of process data, factory connectivity, and automated system cleans. Optional process-control and data-visualization software can be easily integrated with most system configurations.
Automated maintenance functions in our control software can help improve system efficiency and reduce unexpected downtime. With automated clean and prep (ACAP) in the Cortex control system, you can set plasma conditioning and cleaning routines to run according to a variety of triggers, including the number of jobs or wafers that have been run, total RF-on time, and accumulated film thickness. You can also tag recipes and incorporate the tags into ACAP rules, such as running a prep recipe when a tag changes and resetting counters whenever a recipe tagged “clean” is run either automatically or by an operator.
GLANCE™ for Visualization
GLANCE is a comprehensive data-logging and visualization program included with all our systems. GLANCE collects and stores data from one process chamber or an entire fleet of tools in a centralized database. You can chart multiple parameters from one process run and compare a parameter across multiple runs. GLANCE also allows recipe comparison and can highlight differences in recipe parameters. The tool works with both live database and exported datasets, so your engineers can review events, alarms, process parameters, and recipes anytime, anywhere. Multiple users can simultaneously run GLANCE using any device—desktops, laptops, and tablets—to examine and chart process data.
We offer a factory automation interface that conforms to SEMI SECS/GEM standards. Licensed separately, the automation interface allows factory automation host systems to communicate with our tools for actions such as downloading recipes, defining jobs, and responding to events and alarms.
Let our experts help you customize our processes solutions for your applications.