QuaZar™

Our QuaZar systems incorporate high-performance large-area ion sources and advanced motion control for industry-leading process results for challenging etching applications and advanced thin film material applications.

The QuaZar systems, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership. QuaZar’s Marathon grids™ technology is the key enabler of this verified performance. Marathon grids can be installed on existing systems to improve performance and gain two times longer life or better.

The QuaZar IBE system, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership.

Hardware

  • Cluster combinations (up to three modules) or single process module configurations
  • Accommodates 150mm and 200mm wafers and 9.5-inch pallets; scalable to 300mm
  • Advanced motion controls provide up to 40% higher throughput 
  • Wide energy range – ultra-low to high power
  • Long-life Marathon grids sets provide up to three times longer life than standard grids
  • Precision substrate tilt and rotation for maximum profile control
  • Programmable virtual shutter
  • Scanning motion available with optional planetary configuration when ultra-high uniformity is required

Control System

The Cortex® control system provides a stable, user-friendly control interface designed for efficiency and productivity. Cortex benefits include:

  • Graphical, SEMI-standard (E-95) interface
  • Comprehensive recipe editing and process parameter data logging and charting (real-time and post-processing)
  • Automated clean and conditioning routines with configurable triggers
  • Factory automation host interface (with optional SECS/GEM license)
  • User-level access control 
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE™ data logging and visualization tool
  • Same feature-rich control system as used on high-volume production systems

Process

  • Challenging materials (e.g., Ni, Fe, ScAlN, PZT, LTO, LNO)
  • <2% 3-sigma (200mm) and all tilt angles available
  • Applications for data storage, advanced memory, and quantum applications
  • Profile control (e.g., gratings) and avoidance of sidewall redeposition
  • RIBE (reactive ion-beam etching) mode capable

The QuaZar IBD™ system, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership. 

Hardware

  • Cluster combinations (up to 3 modules) or single process module configurations
  • Accommodates 150mm and 200 mm wafers and 9.5-inch pallets; scalable to 300mm
  • Six or eight target configurations with enhanced inter-target shielding
  • Advanced motion controls provide up to 40% higher throughput 
  • Long-life Marathon grids™ sets provide up to three times longer life than standard grids
  • Programmable virtual shutter
  • Assisted IBD capable with secondary ion beam

Control System

The Cortex® control system provides a stable, user-friendly control interface designed for efficiency and productivity. Cortex benefits include:

  • Graphical, SEMI-standard (E-95) interface
  • Comprehensive recipe editing and process parameter data logging and charting (real-time and post-processing)
  • Automated clean and conditioning routines with configurable triggers
  • Factory automation host interface (with optional SECS/GEM license)
  • User-level access control 
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE™ data logging and visualization tool
  • Same feature-rich control system as used on high-volume production systems

Process

  • Passive films (e.g., optical filters)
  • Active films (e.g., bolometers, MRAM, Nb, magnetic transducers)
  • <2% 3-sigma (200mm) and all tilt angles available
  • Reactive ion-beam deposition capable (e.g., stoichiometric and sub-stoichiometric oxides)
  • Film property tuning with ion-beam assisted deposition 

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