QuaZar™

Our QuaZar systems incorporate high-performance large-area ion sources and advanced motion control for industry-leading process results for challenging etching applications and advanced thin film material applications.

The QuaZar systems, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership. QuaZar’s Marathon grids™ technology is the key enabler of this verified performance. Marathon grids can be installed on existing systems to improve performance and gain two times longer life or better.

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The QuaZar IBE system, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership.

Hardware

  • Cluster combinations (up to three modules) or single process module configurations
  • Accommodates 150mm and 200mm wafers and 9.5-inch pallets; scalable to 300mm
  • Advanced motion controls provide up to 40% higher throughput 
  • Wide energy range – ultra-low to high power
  • Long-life Marathon grids sets provide up to three times longer life than standard grids
  • Precision substrate tilt and rotation for maximum profile control
  • Programmable virtual shutter
  • Scanning motion available with optional planetary configuration when ultra-high uniformity is required

Control System

The Cortex® control system provides a stable, user-friendly control interface designed for efficiency and productivity. Cortex benefits include:

  • Graphical, SEMI-standard (E-95) interface
  • Comprehensive recipe editing and process parameter data logging and charting (real-time and post-processing)
  • Automated clean and conditioning routines with configurable triggers
  • Factory automation host interface (with optional SECS/GEM license)
  • User-level access control 
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE™ data logging and visualization tool
  • Same feature-rich control system as used on high-volume production systems

Process

  • Challenging materials (e.g., Ni, Fe, ScAlN, PZT, LTO, LNO)
  • <2% 3-sigma (200mm) and all tilt angles available
  • Applications for data storage, advanced memory, and quantum applications
  • Profile control (e.g., gratings) and avoidance of sidewall redeposition
  • RIBE (reactive ion-beam etching) mode capable

The QuaZar IBD™ system, whether configured for R&D or production, delivers best-in-class uniformity and throughput and the lowest cost of ownership. 

Hardware

  • Cluster combinations (up to 3 modules) or single process module configurations
  • Accommodates 150mm and 200 mm wafers and 9.5-inch pallets; scalable to 300mm
  • Six or eight target configurations with enhanced inter-target shielding
  • Advanced motion controls provide up to 40% higher throughput 
  • Long-life Marathon grids™ sets provide up to three times longer life than standard grids
  • Programmable virtual shutter
  • Assisted IBD capable with secondary ion beam

Control System

The Cortex® control system provides a stable, user-friendly control interface designed for efficiency and productivity. Cortex benefits include:

  • Graphical, SEMI-standard (E-95) interface
  • Comprehensive recipe editing and process parameter data logging and charting (real-time and post-processing)
  • Automated clean and conditioning routines with configurable triggers
  • Factory automation host interface (with optional SECS/GEM license)
  • User-level access control 
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE™ data logging and visualization tool
  • Same feature-rich control system as used on high-volume production systems

Process

  • Passive films (e.g., optical filters)
  • Active films (e.g., bolometers, MRAM, Nb, magnetic transducers)
  • <2% 3-sigma (200mm) and all tilt angles available
  • Reactive ion-beam deposition capable (e.g., stoichiometric and sub-stoichiometric oxides)
  • Film property tuning with ion-beam assisted deposition 

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