Nanotechnology is the
study and use of materials on an atomic or molecular
scale. Nanotechnology is typically less than 100
nm in a single dimension and has the potential to
create many new materials and devices with applications
in medicine, electronics and energy production.
By leveraging the use of photomask, DSE™,
and other core technologies, as well as an in-depth
understanding of critical dimensions at a nano scale,
Plasma-Therm continues to serve the needs of the
growing nanotechnology market.
A strong history of collaborations within the
nanotechnology sector and an extensive reach within
the R&D market positions Plasma-Therm to help
customers with their research and development goals.
- Arrays (e.g. patterned media)
- Film stacks
- High aspect ratio structures
- Low temperature deposition
- Wafer dicing (die singulation)
Controllable etching of gratings and arrays is
achieved with low power processes for III-V materials.
Nano-imprint structures in quartz materials is
done using knowledge from Plasma-Therm’s extensive
For deposition on nano structures, Plasma-Therm
has low temperature PECVD processes including silicon
nitride, silicon oxide, oxy-nitrides and amorphous
Process matching to various applications is possible
due to a variety in selection of Plasma-Therm equipment.
For example, Plasma-Therm systems span from atmospheric
loading to large format cassette-to-cassette.
Each system provides the latitude to vary process
chemistries with minimal system reconditioning.