Etch and PECVD technology applications in nanotechnology

1
 
 
MEOL Mid-End-Of-Line Wireless Photonics Solid State Lighting MEMS/NEMS Nanotechnology Renewable Energies Data Storage Photomask Research and Development

Nanotechnology

Nanotechnology is the study and use of materials on an atomic or molecular scale. Nanotechnology is typically less than 100 nm in a single dimension and has the potential to create many new materials and devices with applications in medicine, electronics and energy production.

By leveraging the use of photomask, DSE™, and other core technologies, as well as an in-depth understanding of critical dimensions at a nano scale, Plasma-Therm continues to serve the needs of the growing nanotechnology market.

A strong history of collaborations within the nanotechnology sector and an extensive reach within the R&D market positions Plasma-Therm to help customers with their research and development goals.

Typical Applications

  • Gratings
  • Channels
  • Arrays (e.g. patterned media)
  • Film stacks
  • High aspect ratio structures
  • Low temperature deposition
  • Wafer Singulation

Controllable etching of gratings and arrays is achieved with low power processes for III-V materials.

Nano-imprint structures in quartz materials is done using knowledge from Plasma-Therm’s extensive photomask program.

For deposition on nano structures, Plasma-Therm has low temperature PECVD processes including silicon nitride, silicon oxide, oxy-nitrides and amorphous silicon.

Process matching to various applications is possible due to a variety in selection of Plasma-Therm equipment. For example, Plasma-Therm systems span from atmospheric loading to large format cassette-to-cassette.

Each system provides the latitude to vary process chemistries with minimal system reconditioning.

Products

 

Detail Images

 
 

 

For more information, contact us at information@plasmatherm.com or at +1.727.577.4999

 

 
 
  legal notice | privacy policy | site map | ©2010-2014 Plasma-Therm