With the phase-out of inefficient incandescent
lighting and continued energy-saving initiatives,
demand for solid-state lighting has never been greater.
The electroluminescence from GaN-based compound
semiconductors has provided the foundation for a
new lighting industry based on high-brightness LEDs.
Plasma-Therm has been a supplier to the leading
LED manufacturers for more than 15 years. With expertise
in etching gallium nitride (GaN), patterned sapphire
substrates (PSS) and silicon carbide (SiC), as well
as deposition of silicon oxide (SiO2) and nitride
(SiNx), Plasma-Therm has partnered with established
industry leaders and with smaller, pioneering companies.
The Plasma-Therm product line includes equipment
for R&D through high-volume production. Innovative
solutions for single wafer and batch clamping provide
cutting-edge etch-rate performance. In addition,
long maintenance intervals are standard with a closed-loop
temperature-controlled source. Low maintenance contributes
to a low cost of ownership for Plasma-Therm systems.
- GaN etch
- PSS (patterned sapphire substrate)
- AlGaInP (and related materials)
- SiNx PECVD stress controlled at high rates with excellent conformality
- SiO2—High breakdown voltage, low stress, low temperature
- Low-temperature PR stripping
For more information, contact
us at email@example.com
or at +1 (727) 577-4999.