With soaring energy costs and global green initiatives,
demand for energy-efficient solid-state lighting is rapidly increasing. The electroluminescence from GaN-based compound semiconductors has provided the foundation
for a new lighting industry based on high-brightness LEDs.
Plasma-Therm has been a supplier to the leading LED manufacturers for more than 15 years.
With expertise in etching gallium nitride (GaN), patterned sapphire substrates (PSS)
and silicon carbide (SiC), as well as deposition of silicon oxide (SiO2) and nitride (SiNx),
Plasma-Therm has partner with well established industry leaders, as
well as smaller pioneering companies.
The Plasma-Therm product line includes equipment for R&D through high volume production.
Innovative solutions for single wafer and batch clamping provide cutting edge etch rate
performance. In addition, long maintenance intervals are standard with a closed-loop
temperature controlled source. Low maintenance contributes to a low cost-of-ownership
for Plasma-Therm systems.
- GaN etch
- PSS (patterned sapphire substrate)
- AlGaInP (and related materials)
- SiNx PECVD stress controlled at high rates with excellent conformality
- SiO2—High breakdown voltage, low stress, low temperature
For more information, contact us at
firstname.lastname@example.org or at +1.727.577.4999