VERSALINE ICP — flexibility and performance

 

VERSALINE DSE
VERSALINE HDPCVD
VERSALINE ICP
VERSALINE PECVD
VERSALINE RIE

VERSALINE ICP

Plasma-Therm’s VERSALINE ICP is the product resulting from decades of technological evolution. Well-known and accepted product lines including the 790, Shuttlelock, and Versalock all played a role in the development of the VERSALINE ICP.

Hardware

  • Flexible and upgradeable handling
          - LL — single substrate or batch carrier loader
          - CX — cassette-to-cassette loading of wafers or carriers
  • Loading configurations for single and multiple wafers
  • 2 MHz ICP RF for efficient coupling of power to the plasma
  • ICP source with temperature control capable of high power
  • Substrate temperature control via mechanical clamp or ESC
  • Efficient thermal management with monoblock electrode construction and an active backside helium circuit
  • Flexible substrate bias options with 13.56 MHz and 40MHz
  • Improved preventative maintenance cycles with thermally managed chamber liner and pump train
  • Digital MFCs with filtered and bypassed gas lines
  • Available substrate electrode temperature ranges –40ºC to 180ºC
  • Chambers with corrosion-resistant surfaces
  • Mag-Lev turbo pump
  • Bulkhead or ballroom installation

Endpoint options

Integrated multifunctional endpoint capability with EndpointWorks®:

  • Laser interferometry
  • Optical emission spectroscopy (OES)
  • Optical emission interferemetry (OEI)
  • System parameters (throttle valve position, pressure, forward power, etc.)
  • Custom inputs such as RGA and ellipsometer

Control system

Cortex® control system provides a user-friendly control interface designed for efficiency and productivity. Cortex benefits include:

  • Graphical, touchscreen compatible, SEMI-standard (E-95) interface
  • Comprehensive process parameter charting (real-time and post-processing)
  • Automated clean and prep (ACAP) routines with configurable triggers, including RF-on time, job count, and wafer count
  • Real-time process data display
  • Factory automation host interface (with optional SECS/GEM license)
  • Integrated recipe editor with step and tabular views
  • Per-user access control for menus, screens, commands and recipes
  • Auto logging of alarms, jobs, calibration, and resource usage
  • Integrated with GLANCE data logging and visualization tool

Process

  • Optimized etch rates
  • High uniformity
  • Low particulates
  • Tunable selectivity
  • Multilayer etch detection
  • Profile control
  • Extensive process library

For more information, contact us at information@plasmatherm.com or at +1.727.577.4999

 
 
 
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